Conference paper
Defect and Diffusion Forum, vol. 194, Trans Tech Publ, 2001, pp. 423--428
APA
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Duan, J., Osetsky, Y. N., & Bacon, D. J. (2001). Atomistic study of self-diffusion in Ni, Al and Ni3Al. In Defect and Diffusion Forum (Vol. 194, pp. 423–428). Trans Tech Publ.
Chicago/Turabian
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Duan, J., Y. N. Osetsky, and D. J. Bacon. “Atomistic Study of Self-Diffusion in Ni, Al and Ni3Al.” In Defect and Diffusion Forum, 194:423–428. Trans Tech Publ, 2001.
MLA
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Duan, J., et al. “Atomistic Study of Self-Diffusion in Ni, Al and Ni3Al.” Defect and Diffusion Forum, vol. 194, Trans Tech Publ, 2001, pp. 423–28.
BibTeX Click to copy
@inproceedings{duan2001a,
title = {Atomistic study of self-diffusion in Ni, Al and Ni3Al},
year = {2001},
organization = {Trans Tech Publ},
pages = {423--428},
volume = {194},
author = {Duan, J. and Osetsky, Y. N. and Bacon, D. J.},
booktitle = {Defect and Diffusion Forum}
}